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Optical micrograph of acrylic sheet exposed through a photomask for 90 s using π2-Cygni system. Numbers on top represent feature size in μm.

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SEM image of 200 nm thick PMMA photoresist on Si substrate exposed through a photomask for 40 s using π2-Cygni system. Numbers on top represent feature size in μm.

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SEM image of gold lines (bright) electrodeposited onto Si substrate using 50 nm thick PMMA photoresist processed in π2-Cygni system for 30 s.