Shifting The Light Processing Paradigm with VUV Radiation
Cygnus Photonics technology eliminates the need for specific resist chemistries - because of the high-energy of the light (7.2 eV per photon), practically any organic polymer can now be utilized as a photoresist! Our systems allow for higher resolution imaging, the use of simple and inexpensive resists, and the elimination of alkali waste generated by traditional DNQ-based resist systems.
New Resists, New Possibilities
Rethink traditional photoresists. Because of the nature of the exposure mechanism, a photosensitizer is no longer needed. Simply put, 172 nm radiation breaks down organic polymer chains until they become volatile and evaporate - there is mass reduction of the exposed polymer. This process is universal - practically all organic polymers can now be used as a photoresist, even in bulk form.
Optical micrograph of acrylic sheet exposed through a photomask for 90 s using π2-Cygni system. Numbers on top represent feature size in μm.
SEM image of 200 nm thick PMMA photoresist on Si substrate exposed through a photomask for 40 s using π2-Cygni system. Numbers on top represent feature size in μm.
SEM image of gold lines (bright) electrodeposited onto Si substrate using 50 nm thick PMMA photoresist processed in π2-Cygni system for 30 s.